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Description: Hydrochloric Acid 37% Cleanroom LP, Standard, Container: Poly bottle, Formula: HCl, CAS Number: 7647-01-0, key ingredient to remove surface metallic ions by forming soluble metal chlorides. 10lb
Catalog Number: 71009-324
Supplier: KMG

Description: Nitric Acid 69.5% Cleanroom LP, Cotainer: Poly bottle, Formula: HNO3, CAS Number: 7697-37-2, strong oxidizing agent, used to oxidize silicon to silicon dioxide and to dissolve metals to metal nitrates. 7lb
Catalog Number: 71009-340
Supplier: KMG

Description: 2-Propanol ≥99.8%
Catalog Number: 71009-372
Supplier: KMG

Description: Sulfuric acid ≥96%, Gigabit®
Catalog Number: 71009-382
Supplier: KMG

Description: Hydrofluoric acid 49%, Cleanroom® MB MB Electronic_industry
Catalog Number: 71009-330
Supplier: KMG

Description: N-Methylpyrrolidone Cleanroom MB, Formula: C5H9NO, safer alternative to many hazardous solvents. NMP can be used remove cured photoresist, clean and dewax silicon wafers, and remove solder flux on printed circuit boards. CAS Number: 872-50-4, 9lb
Catalog Number: 71009-344
Supplier: KMG

Description: Hydrofluoric acid 49%, Cleanroom® MB MB for the electronics industry
Catalog Number: 71009-362
Supplier: KMG

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