Nitric acid 69.5%, Cleanroom® LP for the electronics industry

Supplier: KMG
Danger

200287
71009-340CS 954.61 USD
71009-340
Nitric acid 69.5%, Cleanroom® LP for the electronics industry
Nitric acid

Nitric acid is a strong oxidizing agent. Nitric acid is used to oxidize silicon to silicon dioxide and to dissolve metals to metal nitrates. Nitric acid is used in combination with HF in mixed acid etchants to etch silicon.

Storage: <75⁰ F

Formula: HNO₃
MW: 63.01 g/mol
Boiling Pt: 120.5 °C (1013 hPa)
Melting Pt: –42 °C
Density: 1.4 g/cm³ (20 °C)
Storage Temperature: Ambient
MDL Number: MFCD00011349
CAS Number: 7697-37-2
EINECS: 231-714-2
UN: 2031
ADR: 8,II
Merck Index: 13,06608

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Specification Test Results

Assay (HNO3) 69.00 to 70.00 %
Color 10 APHA
Appearance Conforms
Chloride (Cl) 80 ppb
Phosphate (PO4) 200 ppb
Sulfate (SO4) 200 ppb
Aluminum (Al) 20.00 ppb
Antimony (Sb) 2.00 ppb
Arsenic (As) 2.00 ppb
Barium (Ba) 10.00 ppb
Beryllium (Be) 10.00 ppb
Bismuth (Bi) 20.00 ppb
Boron (B) 10.00 ppb
Cadmium (Cd) 20.00 ppb
Calcium (Ca) 20.00 ppb
Chromium (Cr) 20.00 ppb
Cobalt (Co) 10.00 ppb
Copper (Cu) 20.00 ppb
Gallium (Ga) 10.00 ppb
Germanium (Ge) 10.00 ppb
Gold (Au) 20.00 ppb
Iron (Fe) 20.00 ppb
Lead (Pb) 20.00 ppb
Lithium (Li) 10.00 ppb
Magnesium (Mg) 20.00 ppb
Manganese (Mn) 10.00 ppb
Nickel (Ni) 20.00 ppb
Potassium (K) 20.00 ppb
Silicon (Si) 30.00 ppb
Silver (Ag) 20.00 ppb
Sodium (Na) 20.00 ppb
Strontium (Sr) 20.00 ppb
Tantalum (Ta) 10.00 ppb
Thallium (Tl) 10.00 ppb
Tin (Sn) 20.00 ppb
Titanium (Ti) 10.00 ppb
Tungsten (W) 500.00 ppb
Vanadium (V) 10.00 ppb
Zinc (Zn) 20.00 ppb
Zirconium (Zr) 10.00 ppb
0.5μ Particle Count 60 par/ml
1.0μ Particle Count 10 par/ml
10 par/ml

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