Hydrogen peroxide 30%, Gigabit® for the electronics industry
Supplier: KMG
|
Danger
|
64018
71009-336CS
767.08
USD
71009-336
Hydrogen peroxide 30%, Gigabit® for the electronics industry
Hydrogen peroxide
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Formula:
H₂O₂ MW: 34.01 g/mol Boiling Pt: ∼107 °C (1013 hPa) Melting Pt: < 0 °C Density: 1.11 g/cm³ (20 °C) Storage Temperature: Ambient |
MDL Number:
MFCD00011333 CAS Number: 7722-84-1 EINECS: 231-765-0 UN: 2014 ADR: 5.1,II |
Specification Test Results
Assay H2O2 | 30 - 32 % |
Color APHA | Max 6 |
Free Acid | Max 0.6 μeq/g |
Total Organic Carbon | Max 20000 ppb |
Chloride Cl | Max 30 ppb |
Phosphate PO4 | Max 100 ppb |
Sulfate SO4 | Max 100 ppb |
Aluminum Al | Max 1 ppb |
Antimony Sb | Max 1 ppb |
Arsenic As | Max 1 ppb |
Barium Ba | Max 1 ppb |
Boron B | Max 1 ppb |
Cadmium Cd | Max 1 ppb |
Calcium Ca | Max 1 ppb |
Chromium Cr | Max 1 ppb |
Cobalt Co | Max 1 ppb |
Copper Cu | Max 1 ppb |
Gallium Ga | Max 1 ppb |
Germanium Ge | Max 1 ppb |
Gold Au | Max 1 ppb |
Iron Fe | Max 1 ppb |
Lead Pb | Max 1 ppb |
Lithium Li | Max 1 ppb |
Magnesium Mg | Max 1 ppb |
Manganese Mn | Max 1 ppb |
Molybdenum Mo | Max 1 ppb |
Nickel Ni | Max 1 ppb |
Niobium Nb | Max 1 ppb |
Potassium K | Max 1 ppb |
Sodium Na | Max 1 ppb |
Strontium Sr | Max 1 ppb |
Tin Sn | Max 1 ppb |
Zinc Zn | Max 1 ppb |
0.2 Micron Particle Count | Max 250 Par/ml |
0.5 Micron Particle Count | Max 25 Par/ml |
1.0 Micron Particle Count | Max 25 Par/ml |
Max 25 Par/ml |
Learn more
About VWR
Avantor is a vertically integrated, global supplier of discovery-to-delivery solutions for...