Hydrochloric acid 37%, Cleanroom® LP for the electronics industry
Supplier: KMG
|
Danger
|
Synonyms:
Muriatic acid
, Hydrochloric acid solution
200238
64010
64009
71009-514EA
12541.67
USD
71009-514
71009-500
71009-324
Hydrochloric acid 37%, Cleanroom® LP for the electronics industry
Hydrochloric acid
In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
Storage: <80⁰ F
Formula:
HCl MW: 36.46 g/mol Boiling Pt: 110 °C (1013 hPa) Melting Pt: –30 °C Density: 1.18 g/cm³ (20 °C) Storage Temperature: Ambient |
MDL Number:
MFCD00011324 CAS Number: 7647-01-0 EINECS: 231-595-7 UN: 1789 ADR: 8,II |
Specification Test Results
Assay (HCl) | 37.00 - 38.00% |
Color | 10 APHA |
Appearance | Conforms |
Free Halogens | Conforms |
Phosphate (PO4) | 50 ppb |
Sulfate (SO4) | 300 ppb |
Sulfite (SO3) | 800 ppb |
Aluminum (Al) | 100.0 ppb |
Antimony (Sb) | 5.0 ppb |
Arsenic (As) | 5.0 ppb |
Barium (Ba) | 100.0 ppb |
Boron (B) | 50.0 ppb |
Cadmium (Cd) | 100.0 ppb |
Calcium (Ca) | 100.0 ppb |
Chromium (Cr) | 100.0 ppb |
Cobalt (Co) | 50.0 ppb |
Copper (Cu) | 50.0 ppb |
Gallium (Ga) | 100.0 ppb |
Germanium (Ge) | 100.0 ppb |
Gold (Au) | 100.0 ppb |
Iron (Fe) | 100.0 ppb |
Lead (Pb) | 25.0 ppb |
Lithium (Li) | 100.0 ppb |
Magnesium (Mg) | 100.0 ppb |
Manganese (Mn) | 100.0 ppb |
Nickel (Ni) | 50.0 ppb |
Potassium (K) | 100.0 ppb |
Silicon (Si) | 100.0 ppb |
Silver (Ag) | 50.0 ppb |
Sodium (Na) | 100.0 ppb |
Strontium (Sr) | 100.0 ppb |
Tin (Sn) | 100.0 ppb |
Titanium (Ti) | 100.0 ppb |
Zinc (Zn) | 30.0 ppb |
0.5μ Particle Count | 50 par/ml |
1.0μ Particle Count | 10 par/ml |
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