Tetramethylammonium hydroxide 2,38% semiconductor grade NOVO DEVELOPER 342

Supplier: Transene
Danger

342-GAL 342-QT
76541-052EA 21.29 USD
76541-052 76540-992
Tetramethylammonium hydroxide 2,38% semiconductor grade NOVO DEVELOPER 342
Tetramethylammonium hydroxide

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

Formula: C₄H₁₃NO
MW: 91.15 g/mol
Boiling Pt: 102 °C
Melting Pt: 0 °C
Density: 1.01
Storage Temperature: Ambient
MDL Number: MFCD00008280
CAS Number: 75-59-2
UN: 1835
ADR: 8,II

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Specification Test Results

TMAH Concentration 2,38 %
Typical Development Cycle
Developer 15 to 75 Seconds
Water Rinse 20 to 30 Seconds
Nitrogen Dry 15 to 20 Seconds

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