Silicon Nitride TEM Window Grids, Electron Microscopy Sciences

Supplier: Electron Microscopy Sciences
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76439-572PK 746.49 USD
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Silicon Nitride TEM Window Grids, Electron Microscopy Sciences
Graticules, Reticles and Grids
Silicon Nitride TEM Window Grids perform well under harsh lab conditions.

  • Plasma cleanable - can be vigorously plasma cleaned to remove organic contamination
  • Field to field uniformity - less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
  • Tolerates temperatures above 1000 °C - supports use in environmental TEMs where dynamic processes are observed at high temperatures
  • Withstands harsh conditions - provides an ideal balance of imaging resolution, chemical stability and mechanical strength
  • Incorporates LPCVD, low-stress(~250 MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces

The silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
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