Ultra 20:1
Supplier: KMG
73694
89400-770CS
521
USD
89400-770
Ultra 20:1
Ultra Etch
Wet chemical etching is an integral part of semiconductor manufacturing process. KMG’s line of ultra etchants (BOE w/surfactant) offers a variety of silicon dioxide etching rates and characteristics to meet your processing needs.
Specification Test Results
Assay (HF) | 2.32 - 2.52% |
Assay (NH4F) | 37.5 - 38.5% |
Color | 10 |
Surface Tension | 23 Dynes/cm |
Chloride | 2500 ppb |
Nitrate | 5000 ppb |
Phosphate | 500 ppb |
Sulfate | 1000 ppb |
Aluminum | 20 ppb |
Antimony | 10 ppb |
Arsenic | 10 ppb |
Barium | 10 ppb |
Boron | 10 ppb |
Cadmium | 10 ppb |
Calcium | 20 ppb |
Chromium | 10 ppb |
Cobalt | 10 ppb |
Copper | 10 ppb |
Gallium | 10 ppb |
Germanium | 10 ppb |
Gold | 10 ppb |
Iron | 20 ppb |
Lead | 10 ppb |
Lithium | 10 ppb |
Magnesium | 20 ppb |
Manganese | 10 ppb |
Nickel | 10 ppb |
Potassium | 20 ppb |
Silver | 10 ppb |
Sodium | 20 ppb |
Strontium | 10 ppb |
Tin | 20 ppb |
Titanium | 10 ppb |
Zinc | 10 ppb |
0.5µ Particle Count | 200 par/ml |
1.0µ Particle Count | 20 par/ml |
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