Hydrogen peroxide 30.00 - 32.00% LP
Supplier: KMG
64023
64022
71009-520EA
2620.62
USD
71009-520
71009-366
Hydrogen peroxide 30.00 - 32.00% LP
Hydrogen peroxide
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Formula:
H₂O₂ MW: 34.01 g/mol Boiling Pt: ∼107 °C (1013 hPa) Melting Pt: < 0 °C Density: 1.11 g/cm³ (20 °C) |
MDL Number:
MFCD00011333 CAS Number: 7722-84-1 UN: 2014 ADR: 5.1,II |
Specification Test Results
Assay (H2O2) | 30.00 - 32.00% |
Color | 10 |
Appearance | Conform |
Free Acid | 0.500 µeq/g |
Total Organic Carbon | 20,000 ppb |
Chloride | 200 ppb |
Phosphate | 1500 ppb |
Sulfate | 3000 ppb |
Aluminum | 30 ppb |
Antimony | 5 ppb |
Arsenic | 5 ppb |
Barium | 10 ppb |
Beryllium | 10 ppb |
Bismuth | 10 ppb |
Boron | 10 ppb |
Cadmium | 10 ppb |
Calcium | 80 ppb |
Chromium | 15 ppb |
Cobalt | 10 ppb |
Copper | 20 ppb |
Gallium | 20 ppb |
Germanium | 20 ppb |
Gold | 10 ppb |
Iron | 30 ppb |
Lead | 100 ppb |
Lithium | 10 ppb |
Magnesium | 30 ppb |
Manganese | 10 ppb |
Molybdenum | 10 ppb |
Nickel | 10 ppb |
Niobium | 10 ppb |
Potassium | 400 ppb |
Silicon | 100 ppb |
Silver | 20 ppb |
Sodium | 100 ppb |
Strontium | 20 ppb |
Tantalum | 15 ppb |
Thallium | 20 ppb |
Tin | 500 ppb |
Titanium | 20 ppb |
Vanadium | 10 ppb |
Zinc | 25 ppb |
Zirconium | 10 ppb |
0.20µ Particle Count | 1000 par/ml |
0.50µ Particle Count | 100 par/ml |
1.00µ Particle Count | 10 par/ml |
Learn more
About VWR
Avantor is a vertically integrated, global supplier of discovery-to-delivery solutions for...