Buffered oxide etch 50:1

Supplier: KMG

62062
89400-756CS 729.85 USD
89400-756
Buffered oxide etch 50:1
Buffered oxide etch

Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.

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Specification Test Results

Assay (HF) 0.90 - 1.10%
Assay (NH4F) 38.70 - 39.70%
Appearance Conform
Chloride 2500 ppb
Nitrate 5000 ppb
Phosphate 500 ppb
Sulfate 1000 ppb
Aluminum 20 ppb
Antimony 5 ppb
Arsenic 5 ppb
Barium 10 ppb
Boron 10 ppb
Cadmium 10 ppb
Calcium 30 ppb
Chromium 10 ppb
Cobalt 10 ppb
Copper 10 ppb
Gallium 10 ppb
Germanium 10 ppb
Gold 10 ppb
Iron 50 ppb
Lead 20 ppb
Lithium 10 ppb
Magnesium 20 ppb
Manganese 10 ppb
Nickel 10 ppb
Potassium 25 ppb
Silver 10 ppb
Sodium 50 ppb
Strontium 10 ppb
Tin 20 ppb
Titanium 20 ppb
Zinc 10 ppb
0.5µ Particle Count 160 par/ml
1.0µ Particle Count 8 par/ml

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