Aluminum etch TYPE A semiconductor grade
Supplier: Transene
|
Danger
|
0026000-GAL
0026000-QT
76541-072EA
49.42
USD
76541-072
76541-030
Aluminum etch TYPE A semiconductor grade
Aluminum etch
Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.
Boiling Pt:
100 °C (water) Density: 1.45 g/cc Storage Temperature: Ambient |
UN:
3264 ADR: 8,II |
Specification Test Results
Appearance | Water-white to light yellow |
Etch Capacity (rate declines at ~70%) | 60 g/gallon |
Etch Rate at 25°C | 30/sec Å/sec |
Etch Rate at 40°C | 80/sec Å/sec |
Filtration | 0,2 um |
Incompatible Materials | Aluminum oxide, silicon nitride |
pH | Strongly acidic |
Recommended Operating Temperatures | 20-80°C (30-40°C most common) °C |
Shelf Life | 1 year |
Storage Conditions | Ambient |
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