Aluminum etch TYPE A semiconductor grade

Supplier: Transene
Danger

0026000-GAL 0026000-QT
76541-072EA 49.42 USD
76541-072 76541-030
Aluminum etch TYPE A semiconductor grade
Aluminum etch

Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.

Boiling Pt: 100 °C (water)
Density: 1.45 g/cc
Storage Temperature: Ambient
UN: 3264
ADR: 8,II

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Specification Test Results

Appearance Water-white to light yellow
Etch Capacity (rate declines at ~70%) 60 g/gallon
Etch Rate at 25°C 30/sec Å/sec
Etch Rate at 40°C 80/sec Å/sec
Filtration 0,2 um
Incompatible Materials Aluminum oxide, silicon nitride
pH Strongly acidic
Recommended Operating Temperatures 20-80°C (30-40°C most common) °C
Shelf Life 1 year
Storage Conditions Ambient

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